Details and photos of my newest maskless photolithography stepper have been posted here: Info Page
Automated DLP submicron stepper for 2″ (50mm) wafers with LabView control, computer alignment, and wafer vacuum chuck. Based on an old Nikon microscope with custom optics and in-situ UV-VIS spectroscopy for illumination process control. Diffraction-limited resolution is <250nm with a 365nm light source.
Phish dancing bears! This is amazing!
你们非常厉害！
我们组现也准备做无掩膜工艺的研究。
现在卡在无掩膜如何实现（LCD用紫外的话会被紫外改性，能用的DLP设备（能透过紫外）不是一个中国的中学生（我）能负担的起的）和载片台的定位精度（套刻对准），以及到亚微米（.18、.25um）（有可能会深入到纳米（nm））时的晶片观察（电镜？在中国这不是个人容易买到的东西（应该说至少不是一般中学生买得起的（实在是太贵了）））。
（以上提到的均为半导体组亚微米工设备组现在面临的问题）
我希望我们能讨论（邮箱你应该看得到吧）
【I hope we can discuss it together(I think you should see the email of me)】
Hi, I’m happy to help, please email me at sam@zeloof.xyz so we can discuss
Its really incredible!
I am also fond of some silicon gadgets, while I am not really understand how to make sure the position of the wafer is precise enough during photolithography, and I also have some problems with maskless photolithography technique.