Mark IV Maskless Submicron Photolithography Stepper

Details and photos of my newest maskless photolithography stepper have been posted here: Info Page

_D7V8230

Automated DLP submicron stepper for 2″ (50mm) wafers with LabView control, computer alignment, and wafer vacuum chuck. Based on an old Nikon microscope with custom optics and in-situ UV-VIS spectroscopy for illumination process control. Diffraction-limited resolution is <250nm with a 365nm light source.

SEM image
SEM image

3 thoughts on “Mark IV Maskless Submicron Photolithography Stepper”

  1. 你们非常厉害!
    我们组现也准备做无掩膜工艺的研究。
    现在卡在无掩膜如何实现(LCD用紫外的话会被紫外改性,能用的DLP设备(能透过紫外)不是一个中国的中学生(我)能负担的起的)和载片台的定位精度(套刻对准),以及到亚微米(.18、.25um)(有可能会深入到纳米(nm))时的晶片观察(电镜?在中国这不是个人容易买到的东西(应该说至少不是一般中学生买得起的(实在是太贵了)))。
    (以上提到的均为半导体组亚微米工设备组现在面临的问题)
    我希望我们能讨论(邮箱你应该看得到吧)
    【I hope we can discuss it together(I think you should see the email of me)】

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